Study of electrical characteristic in heavily doped p-type Si1-xGex/Si hetero-structure by infrared ellipsometric spectroscopy

被引:0
|
作者
College of Physics and Electronics Engineering, Xinyang Normal University, Xinyang 464000, China [1 ]
机构
来源
J Rare Earth | 2006年 / SUPPL. 3卷 / 386-389期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Study of Electrical Characteristic in Heavily Doped P-Type Si1-xGex/Si Hetero-Structure by Infrared Ellipsometric Spectroscopy
    陈长春
    刘江峰
    余本海
    戴启润
    JournalofRareEarths, 2006, (S2) : 386 - 389
  • [2] Determination of boron concentration in heavily doped p-type Si1-xGex/Si heterostructure by infrared ellipsometric spectroscopy
    Chen, Changchun
    Liu, Jiangfeng
    Yu, Benhai
    Dai, Qirun
    MICROELECTRONICS JOURNAL, 2007, 38 (03) : 392 - 397
  • [3] Electrical properties in Si/Si1-xGex/Si p-type modulation doped heterostructures
    Hwang, YT
    Kim, HS
    Woo, SJ
    Lim, SH
    Lee, HJ
    COMPOUND SEMICONDUCTORS 1995, 1996, 145 : 497 - 500
  • [4] Hall factor in strained p-type doped Si1-xGex alloy
    Fu, Y
    Joelsson, KB
    Grahn, KJ
    Ni, WX
    Hansson, GV
    Willander, M
    PHYSICAL REVIEW B, 1996, 54 (16): : 11317 - 11321
  • [5] Infrared response of heavily doped p-type si and SiGe alloys from ellipsometric measurements
    Humlícek, J
    Krápek, V
    Physics of Semiconductors, Pts A and B, 2005, 772 : 113 - 114
  • [6] Ellipsometric study of Fano resonance in heavily doped p-type Si and SiGe alloys
    Humlicek, J
    THIN SOLID FILMS, 1998, 313 : 656 - 660
  • [7] ENERGY-BAND STRUCTURE FOR STRAINED P-TYPE SI1-XGEX
    MANKU, T
    NATHAN, A
    PHYSICAL REVIEW B, 1991, 43 (15): : 12634 - 12637
  • [8] EFFECTIVE MASS FOR STRAINED P-TYPE SI1-XGEX
    MANKU, T
    NATHAN, A
    JOURNAL OF APPLIED PHYSICS, 1991, 69 (12) : 8414 - 8416
  • [9] Intersubband absorption in modulation-doped p-type Si/Si1-xGex quantum wells: a systematic study
    Fromherz, Thomas
    Koppensteiner, Ewald
    Helm, Manfred
    Bauer, Gunther
    Nutzel, Joachim
    Abstreiter, Gerhard
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1994, 33 (4 B): : 2361 - 2364
  • [10] TRANSPORT PROPERTY OF SI SI1-XGEX SI P-TYPE MODULATION-DOPED DOUBLE-HETEROSTRUCTURE
    JIANG, RL
    LIU, JL
    ZHENG, YD
    LI, HF
    ZHENG, HZ
    JOURNAL OF APPLIED PHYSICS, 1994, 76 (04) : 2544 - 2546