Hollow cathode effect modified time-dependent global model and high-power impulse magnetron sputtering discharge and transport in cylindrical cathode

被引：0
|
作者：
Cui, Suihan [1 ]
Wu, Zhongzhen [1 ,2 ]
Lin, Hai [1 ]
Xiao, Shu [1 ]
Zheng, Bocong [1 ]
Liu, Liangliang [1 ]
An, Xiaokai [1 ]
Fu, Ricky K. Y. [2 ]
Tian, Xiubo [1 ]
Tan, Wenchang [1 ]
Chu, Paul K. [2 ]
机构：
[1] School of Advanced Materials, Peking University, Shenzhen Graduate School, Shenzhen,518055, China
[2] Department of Physics, City University of Hong Kong, Kowloon, Hong Kong
来源：
Journal of Applied Physics | 2019年 / 125卷 / 06期
关键词：
Electric discharges - Simulation platform - Electron sources - Ionization - Magnetron sputtering - Plasma density - Deposition rates - Ions;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [31] Study of high-power pulsed RF generators based on a hollow-cathode discharge
    S. V. Bulychev
    D. V. Vyalykh
    A. E. Dubinov
    V. S. Zhdanov
    I. Yu. Kornilova
    I. L. L’vov
    S. K. Saikov
    S. A. Sadovoy
    V. D. Selemir
    Plasma Physics Reports, 2009, 35 : 941 - 961
  • [32] In situ plasma diagnostics study of a commercial high-power hollow cathode magnetron deposition tool
    Meng, Liang
    Raju, Ramasamy
    Flauta, Randolph
    Shin, Hyungjoo
    Ruzic, David N.
    Hayden, Douglas B.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2010, 28 (01): : 112 - 118
  • [33] Effect of ion bombardment on TiN films deposited high-power impulse magnetron sputtering
    Wang, A. (aywang@nimte.ac.cn), 1600, Science Press (34):
  • [34] Dynamic transition in the discharge current between gas-dominant discharge and self-sputtering in high-power impulse magnetron sputtering
    Wu, Zhongzhen
    Xiao, Shu
    Ma, Zhengyong
    Cui, Suihan
    Pan, Feng
    Tian, Xiubo
    Fu, Ricky K. Y.
    Chu, Paul K.
    SURFACE & COATINGS TECHNOLOGY, 2016, 306 : 319 - 322
  • [35] Steady state discharge optimization in high-power impulse magnetron sputtering through the control of the magnetic field
    Capek, J.
    Hala, M.
    Zabeida, O.
    Klemberg-Sapieha, J. E.
    Martinu, L.
    JOURNAL OF APPLIED PHYSICS, 2012, 111 (02)
  • [36] (AlCrNbSiTi)N/TiN multilayer films designed by a hybrid coating system combining high-power impulse magnetron sputtering and cathode arc deposition
    Lee, Ching-Yin
    Lin, Su-Jien
    Yeh, Jien-Wei
    SURFACE & COATINGS TECHNOLOGY, 2023, 468
  • [37] Effects of Cathode Voltage Pulse Width in High Power Impulse Magnetron Sputtering on the Deposited Chromium Thin Films
    Kuo, Chin-Chiuan
    Lin, Chun-Hui
    Lin, Yu-Tse
    Chang, Jing-Tang
    COATINGS, 2020, 10 (06)
  • [38] High-Power Compact P-Band UHF Oscillator Based on Hollow Cathode Discharge
    Bulychev, Sergey V.
    Dubinov, Alexander E.
    L'vov, Igor L.
    Sadovoy, Sergey A.
    Selemir, Victor D.
    Valiulina, Valeria K.
    Vyalykh, Dmitry V.
    Zhdanov, Victor S.
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2015, 43 (06) : 1906 - 1910
  • [39] Discharge model and plasma characteristics of high-power pulsed magnetron sputtering titanium target
    Chen Chang-Zi
    Ma Dong-Lin
    Li Yan-Tao
    Leng Yong-Xiang
    ACTA PHYSICA SINICA, 2021, 70 (18)
  • [40] Deposition of Ti-Zr alloy films using Ti and Zr dual-cathode high-power impulse magnetron co-sputtering
    Kuo, Chin-Chiuan
    Lin, Yu-Tse
    Liu, Wen -Chung
    SURFACE & COATINGS TECHNOLOGY, 2024, 476
12345