Structural properties of silicon thin films prepared by hot-wire-assisted electron cyclotron resonance chemical vapor deposition

被引：0
|
作者：
Li, Ying [1 ]
Kumeda, Minoru [1 ]
Morimoto, Akiharu [1 ]
Kawae, Takeshi [1 ]
Chen, Guanghua [2 ]
机构：
[1] Graduate School of Natural Science and Technology, Kanazawa University, Kakuma-machi, Kanazawa 920-1192, Japan
[2] Materials Science and Engineering, Beijing University of Technology, Beijing 100022, China
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1600年 / 46卷 / 02期
关键词：
28;
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摘要：
Journal article (JA)
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页码：751 / 755
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