Structural properties of silicon thin films prepared by hot-wire-assisted electron cyclotron resonance chemical vapor deposition

被引：0

作者：

Li, Ying ^{[1
]}

Kumeda, Minoru ^{[1
]}

Morimoto, Akiharu ^{[1
]}

Kawae, Takeshi ^{[1
]}

Chen, Guanghua ^{[2
]}

机构：

[1] Graduate School of Natural Science and Technology, Kanazawa University, Kakuma-machi, Kanazawa 920-1192, Japan

[2] Materials Science and Engineering, Beijing University of Technology, Beijing 100022, China

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1600年 / 46卷 / 02期

关键词：

28;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Journal article (JA)

引用

页码：751 / 755

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