Formation of self-assembled monolayers on Si-DLC films and their friction properties

Self-assembled monolayers (SAMs) of 1H, 1H, 2H, 2H- perfluorodecyltrichlorosilane (FDTS) were prepared on silicon-incorporated diamond-like carbon (Si-DLC) films using immersion method. The Si-DLC films were deposited on silicon plates using bipolar-type plasma based ion implantation and deposition technique. SAM formation was verified by atomic force microscopy (AFM), contact angle measurements and X-ray photoelectron spectroscopy (XPS), and friction properties and thermal stability of SAMs on Si-DLC films were investigated. The main results are as follows: The rate of SAM formation increases with increasing Si-content in Si-DLC film. This is because of the increase of adsorption sites on the Si-DLC film surface due to structural modification of DLC film. Also, the friction properties of SAM/Si-DLC films were improved with increasing Si content due to stabilization of interface between SAM and Si-DLC film. The SAM/Si-DLC film has temperature stability up to 450°C, and application as a mold release layer to thermal nanoimprint lithography is expected.