Formation of self-assembled monolayers on Si-DLC films and their friction properties

被引：0

作者：

Choi, Junho ^{[1
]}

Sakurai, Kenichi ^{[2
]}

Kato, Takahisa ^{[1
]}

Kawaguchi, Masahiro ^{[3
]}

机构：

[1] School of Engineering, University of Tokyo, 3-1, Hongo 7-chõme, Bunkyo-ku, Tokyo 113-8656, Japan

[2] Graduate School, University of Tokyo, Japan

[3] Advanced Material Processing Group, Tokyo Metropolitan Industrial Technology Research Institute, 13-10, Nishigaoka 3-chõme, Kita-ku, Tokyo 115-8586, Japan

来源：

Toraibarojisuto/Journal of Japanese Society of Tribologists | 2010年 / 55卷 / 08期

关键词：

Silicon - Friction - Self assembled monolayers - Carbon - Interfaces (materials) - Tribology - Nanoimprint lithography - Diamond like carbon films - Ion implantation - Atomic force microscopy - Carbon films - X ray photoelectron spectroscopy;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Self-assembled monolayers (SAMs) of 1H, 1H, 2H, 2H- perfluorodecyltrichlorosilane (FDTS) were prepared on silicon-incorporated diamond-like carbon (Si-DLC) films using immersion method. The Si-DLC films were deposited on silicon plates using bipolar-type plasma based ion implantation and deposition technique. SAM formation was verified by atomic force microscopy (AFM), contact angle measurements and X-ray photoelectron spectroscopy (XPS), and friction properties and thermal stability of SAMs on Si-DLC films were investigated. The main results are as follows: The rate of SAM formation increases with increasing Si-content in Si-DLC film. This is because of the increase of adsorption sites on the Si-DLC film surface due to structural modification of DLC film. Also, the friction properties of SAM/Si-DLC films were improved with increasing Si content due to stabilization of interface between SAM and Si-DLC film. The SAM/Si-DLC film has temperature stability up to 450°C, and application as a mold release layer to thermal nanoimprint lithography is expected.

引用

页码：572 / 578

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