Dynamic behavior of AlN film grow by reactive magnetron sputtering

被引:0
|
作者
Tong, Hongbo [1 ]
Liu, Qing [1 ]
Ba, Dechun [2 ]
机构
[1] School of Mechanical Engineering, Liaoning Shihua University, Fushun 113001, China
[2] School of Mechanical Engineering and Automation, Northeastern University, Shenyang 110004, China
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:31 / 34
相关论文
共 50 条
  • [31] Epitaxial Ti2AlN(0001) thin film deposition by dual-target reactive magnetron sputtering
    Persson, P. O. A.
    Kodambaka, S.
    Petrov, I.
    Hultman, L.
    ACTA MATERIALIA, 2007, 55 (13) : 4401 - 4407
  • [32] Preparation of ScAlN thin film through reactive magnetron sputtering
    Chen Y.-X.
    Liu Y.-F.
    Shang Z.-G.
    Guangxue Jingmi Gongcheng/Optics and Precision Engineering, 2020, 28 (09): : 1924 - 1929
  • [33] Growth of AlN films by magnetron sputtering
    Uchiyama, S
    Ishigami, Y
    Ohta, M
    Niigaki, M
    Kan, H
    Nakanishi, Y
    Yamaguchi, T
    JOURNAL OF CRYSTAL GROWTH, 1998, 189 : 448 - 451
  • [34] Growth of AlN films by magnetron sputtering
    Central Research Lab, Shizuoka, Japan
    J Cryst Growth, (448-451):
  • [35] Magnetron sputtering growth of AlN film for photocatalytic CO2 reduction
    Jintian Liu
    Hui Zhang
    Xinjian Xie
    Huan Li
    Xiang Zheng
    Bowen Lu
    Guifeng Chen
    Research on Chemical Intermediates, 2022, 48 : 4135 - 4144
  • [36] Optimizing Technology of the Preparation of AlN Thin Film by Magnetron Sputtering for Acoustic Resonators
    Ma X.
    Cheng Z.
    Wang M.
    He J.
    Zou W.
    Deng S.
    Cailiao Daobao/Materials Reports, 2023, 37 (11):
  • [37] Magnetron sputtering growth of AlN film for photocatalytic CO2 reduction
    Liu, Jintian
    Zhang, Hui
    Xie, Xinjian
    Li, Huan
    Zheng, Xiang
    Lu, Bowen
    Chen, Guifeng
    RESEARCH ON CHEMICAL INTERMEDIATES, 2022, 48 (10) : 4135 - 4144
  • [38] Photoluminescence and characteristics of terbium-doped AlN film prepared by magnetron sputtering
    Liu, FS
    Ma, WJ
    Liu, QL
    Liang, JK
    Luo, J
    Yang, LT
    Song, GB
    Zhang, Y
    Rao, GH
    APPLIED SURFACE SCIENCE, 2005, 245 (1-4) : 391 - 399
  • [39] DYNAMIC CONTROL OF REACTIVE MAGNETRON SPUTTERING - A THEORETICAL-ANALYSIS
    SPENCER, AG
    HOWSON, RP
    THIN SOLID FILMS, 1990, 186 (01) : 129 - 136
  • [40] Effects of sputtering pressure on microstructure and secondary electron emission properties of AlN film prepared by magnetron sputtering
    Wang, Yunrong
    Xia, Zhangcong
    Wu, Shengli
    Li, Jie
    MATERIALS LETTERS, 2024, 377