Effect of N2 gas pressure ratio and DC bias on formation of iron nitride thin film by RF sputtering method

被引：0
|
作者：
Seki, Takahiro [1 ]
Niizuma, Kiyozumi [2 ]
机构：
[1] Electrical and Electronic Engineering, Graduate School of Industrial Technology, Nihon University, 1-2-1, Izumi-cho, Narashino 275-8575, Japan
[2] College of Industrial Technology, Nihon University, 1-2-1, Izumi-cho, Narashino 275-8575, Japan
来源：
IEEJ Transactions on Fundamentals and Materials | 2014年 / 134卷 / 01期
关键词：
D O I：
10.1541/ieejfms.134.47
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学科分类号：
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页码：47 / 52
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