Silicon carbonitride thin-film coatings fabricated by remote hydrogen-nitrogen microwave plasma chemical vapor deposition from a single-source precursor: Growth process, structure, and properties of the coatings

被引：0

作者：

Wrobel, A.M. ^{[1
]}

Blaszczyk-Lezak, I. ^{[1
]}

Walkiewicz-Pietrzykowska, A. ^{[1
]}

机构：

[1] Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, PL-90-363 Lodz, Poland

来源：

Journal of Applied Polymer Science | 2007年 / 105卷 / 01期

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摘要：

Journal article (JA)

引用

页码：122 / 129

共 40 条

[21] REMOTE HYDROGEN PLASMA CHEMICAL-VAPOR-DEPOSITION OF AMORPHOUS HYDROGENATED SILICON-CARBON FILMS FROM AN ORGANOSILANE MOLECULAR CLUSTER AS A NOVEL SINGLE-SOURCE PRECURSOR - STRUCTURE, GROWTH-MECHANISM, AND PROPERTIES OF THE DEPOSIT
WROBEL, AM
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NAKANISHI, Y
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CHEMISTRY OF MATERIALS, 1995, 7 (07) : 1403 - 1413
[22] Amorphous Hydrogenated Silicon Carbide (a-SiC:H) Coatings Produced by Remote Hydrogen Microwave Plasma CVD from Bis(dimethylsilyl)ethane - a Novel Single-Source Precursor
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[23] Study on the interatomic binding structure of diamond thin-film deposited by microwave plasma enhanced chemical vapor deposition process
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[24] Aerosol-assisted chemical vapor deposition of copper sulfide nanostructured thin film from newly synthesized single-source precursor
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[25] HIGH-PERFORMANCE POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS FABRICATED USING REMOTE PLASMA CHEMICAL-VAPOR-DEPOSITION OF SIO(2)
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HARA, M
SANO, N
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[26] Mechanical and tribological properties of thin remote microwave plasma CVD a-Si:N:C films from a single-source precursor
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Wrobel, AM
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TRIBOLOGY LETTERS, 2002, 13 (02) : 71 - 76
[27] Mechanical and Tribological Properties of Thin Remote Microwave Plasma CVD a-Si:N:C Films from a Single-Source Precursor
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Aleksander M. Wrobel
Agnieszka Walkiewicz-Pietrzykowska
Tribology Letters, 2002, 13 : 71 - 76
[28] Control of orientation for polycrystalline silicon thin films fabricated from fluorinated source gas by microwave plasma enhanced chemical vapor deposition
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Miida, Atsushi
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Maeda, Yoshiteru
Fortmann, Charles M.
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1998, JJAP, Tokyo, Japan (37):
[29] Control of orientation for polycrystalline silicon thin films fabricated from fluorinated source gas by microwave plasma enhanced chemical vapor deposition
Nakahata, K
Miida, A
Kamiya, T
Maeda, Y
Fortmann, CM
Shimizu, I
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1998, 37 (9AB): : L1026 - L1029
[30] Remote hydrogen microwave plasma CVD of silicon carbonitride films from a tetramethyldisilazane source. Part 1: Characterization of the process and structure of the films
Wrobel, Aleksander M.
Blaszczyk-Lezak, Iwona
CHEMICAL VAPOR DEPOSITION, 2007, 13 (11) : 595 - 600

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