Silicon carbonitride thin-film coatings fabricated by remote hydrogen-nitrogen microwave plasma chemical vapor deposition from a single-source precursor: Growth process, structure, and properties of the coatings

被引：0

作者：

Wrobel, A.M. ^{[1
]}

Blaszczyk-Lezak, I. ^{[1
]}

Walkiewicz-Pietrzykowska, A. ^{[1
]}

机构：

[1] Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, PL-90-363 Lodz, Poland

来源：

Journal of Applied Polymer Science | 2007年 / 105卷 / 01期

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摘要：

Journal article (JA)

引用

页码：122 / 129

共 40 条

[1] Silicon carbonitride thin-film coatings fabricated by remote hydrogen-nitrogen microwave plasma chemical vapor deposition from a single-source precursor: Growth process, structure, and properties of the coatings
Wrobel, A. M.
Blaszczyk-Lezak, I.
Walkiewicz-Pietrzykowska, A.
JOURNAL OF APPLIED POLYMER SCIENCE, 2007, 105 (01) : 122 - 129
[2] Reactivity of organosilicon precursors in remote hydrogen microwave plasma chemical vapor deposition of silicon carbide and silicon carbonitride thin-film coatings
Wrobel, A. M.
Walkiewicz-Pietrzykowska, A.
Blaszczyk-Lezak, I.
APPLIED ORGANOMETALLIC CHEMISTRY, 2010, 24 (03) : 201 - 207
[3] Amorphous silicon carbonitride thin-film coatings produced by remote nitrogen microwave plasma chemical vapour deposition using organosilicon precursor
Wrobel, A. M.
Uznanski, P.
Walkiewicz-Pietrzykowska, A.
Jankowski, K.
APPLIED ORGANOMETALLIC CHEMISTRY, 2017, 31 (12)
[4] Amorphous silicon carbonitride a-SiCN thin film coatings by remote plasma chemical vapor deposition using organosilicon precursor: Effect of plasma composition
Wrobel, Aleksander M.
Uznanski, Pawel
PLASMA PROCESSES AND POLYMERS, 2023, 20 (03)
[5] Remote microwave plasma chemical vapor deposition of thin Si:N:C films from a single-source precursor
Wróbel, A.M.
Walkiewicz-Pietrzykowska, A.
Stasiak, M.
Klemberg-Sapieha, J.E.
Bielinski, D.M.
Aoki, T.
Hatanaka, Y.
Journal of Wide Bandgap Materials, 2000, 8 (01): : 3 - 15
[6] Hard silicon carbonitride thin-film coatings produced by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 1: Deposition mechanism, chemical structure, and surface morphology
Wrobel, Aleksander M.
Uznanski, Pawel
PLASMA PROCESSES AND POLYMERS, 2021, 18 (05)
[7] Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Compositional and structural dependencies of film properties
Blaszczyk-Lezak, I.
Wrobel, A. M.
Bielinski, D. M.
DIAMOND AND RELATED MATERIALS, 2006, 15 (10) : 1650 - 1658
[8] Amorphous silicon carbonitride (a-SiCN) thin film coatings by remote plasma chemical vapor deposition using organosilicon precursor: Effect of substrate temperature
Wrobel, Aleksander M.
Uznanski, Pawel
PLASMA PROCESSES AND POLYMERS, 2023, 20 (04)
[9] HIGH-QUALITY AMORPHOUS HYDROGENATED SILICON-CARBIDE COATINGS BY REMOTE PLASMA CHEMICAL-VAPOR-DEPOSITION FROM A SINGLE-SOURCE PRECURSOR
WROBEL, AM
WICKRAMANAYAKA, S
NAKANISHI, Y
HATANAKA, Y
JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 1995, 53 (1-2) : 477 - 482
[10] Remote Hydrogen Microwave Plasma Chemical Vapor Deposition of Amorphous Silicon Carbonitride (a-SiCN) Coatings Derived From Tris(dimethylamino)Silane
Wrobel, Aleksander M.
Blaszczyk-Lezak, Iwona
Uznanski, Pawel
Glebocki, Bartosz
PLASMA PROCESSES AND POLYMERS, 2011, 8 (06) : 542 - 556

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