The experimental study and analysis of the etching for SiO2 sacrificial layer

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Key Lab. of Micro and Nano Electromechanical Systems of Shanxi Province, Northwestern Polytechnical University, Xi'an 710072, China ^{[1
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Yadian Yu Shengguang | 2008年 / 3卷 / 372-375期

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[31] STUDY OF DRY ETCHING-RELATED CONTAMINATIONS ON SI AND SIO2
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[32] Chemical etching failure of SiO2 film
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[33] Etching mechanisms of SiO2 in hydrofluoric acid
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