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- [5] Analysis of fluorocarbon deposition during SiO2 etching Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1996, 35 (4 B): : 2463 - 2467
- [6] Analysis of fluorocarbon deposition during SiO2 etching JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (4B): : 2463 - 2467
- [8] Atomic Layer Etching of SiO2 for Nanoscale Semiconductor Devices: A Review APPLIED SCIENCE AND CONVERGENCE TECHNOLOGY, 2024, 33 (01): : 1 - 6
- [9] Scaling of atomic layer etching of SiO2 in fluorocarbon plasmas: Transient etching and surface roughness JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2021, 39 (03):