共 50 条
- [31] Magnetic metal etching with organic based plasmas.: I.: CO/H2 plasmas JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (04): : 1589 - 1596
- [35] Inhibition of nitrogen uptake by SiO2 surface films formed on stainless steel during annealing in H2/N2 atmospheres Metallurgical transactions. A, Physical metallurgy and materials science, 1988, 19 A (12): : 3045 - 3055
- [36] Nitridation of vacuum evaporated molybdenum films in H2/N2 mixtures JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1998, 16 (04): : 2510 - 2516
- [37] Self-consistent modeling of microwave activated N2/CH4/H2 (and N2/H2) plasmas relevant to diamond chemical vapor deposition PLASMA SOURCES SCIENCE & TECHNOLOGY, 2022, 31 (03):
- [38] CH4/N2 plasma etching for organic Low-k dielectric material JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (09): : 5775 - 5781
- [40] Nonequilibrium Processes in Supersonic Jets of N2, H2, and N2 + H2 Mixtures: (I) Zone of Silence JOURNAL OF PHYSICAL CHEMISTRY A, 2009, 113 (30): : 8506 - 8512