Influence of working gas on structures of silicon nitride thin films

被引：0
|
作者：
Xu, Zheng [1 ]
Jia, Xiaoyun [1 ]
Zhao, Suling [1 ]
Zhang, Fujun [1 ]
Tang, Yu [2 ]
Zhou, Chunlan [2 ]
Wang, Wenjing [2 ]
机构：
[1] Key Laboratory of Luminescence and Optical Information, Institute of Optoelectronics Technology, Beijing Jiaotong University, Beijing 100044, China
[2] Institute of Electrical Engineering, Chinese Acad. of Sci., Beijing 100083, China
来源：
Taiyangneng Xuebao/Acta Energiae Solaris Sinica | 2008年 / 29卷 / 11期
关键词：
Optical properties;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：1344 / 1347
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