Effect of the process parameters of inductively coupled plasma reactive ion etching on the fabrication of diamond nanotips

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[1] Mehedi, Hasan-Al
[2] Mille, Vianney
[3] Achard, Jocelyn
[4] Brinza, Ovidiu
[5] Gicquel, Alix
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Mehedi, Hasan-Al | 1600年 / Wiley-VCH Verlag卷 / 211期
关键词：
Aspect ratio - Electron beam lithography - Fabrication - Ions - Single crystals - Nanotips - Diamonds - Inductively coupled plasma - Plasma etching;
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