Properties of InGaN films grown by reactive sputtering

被引：0
|
作者：
Synchrotron Light Application Center, Saga University, Saga 840-8502, Japan [1 ]
不详 [2 ]
机构：
来源：
Jpn. J. Appl. Phys. | / 8 PART 1卷
关键词：
Compendex;
D O I：
081203
中图分类号：
学科分类号：
摘要：
III-V semiconductors
引用
收藏
相关论文
共 50 条
  • [21] Preparation and properties of IrO2 thin films grown by DC magnetron reactive sputtering method
    Wang, SJ
    Ding, AL
    Qiu, PS
    He, XY
    Luo, WG
    FOURTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS, 2000, 4086 : 454 - 457
  • [22] Nanocrystalline Ga1-xMnxN films grown by reactive sputtering
    Leite, D. M. G.
    da Silva, L. F.
    Pereira, A. L. J.
    da Silva, J. H. Dias
    JOURNAL OF CRYSTAL GROWTH, 2006, 294 (02) : 309 - 314
  • [23] POSTHYDROGENATION STUDY OF A-SI FILMS GROWN BY REACTIVE MAGNETRON SPUTTERING
    LIANG, YH
    ABELSON, JR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1994, 12 (04): : 1099 - 1102
  • [24] Influence of nitrogen flow rates on materials properties of CrN x films grown by reactive magnetron sputtering
    Subramanian, B.
    Prabakaran, K.
    Jayachandran, M.
    BULLETIN OF MATERIALS SCIENCE, 2012, 35 (04) : 505 - 511
  • [25] Properties of anatase CoxTi1-xO2 thin films epitaxially grown by reactive sputtering
    Jeong, BS
    Heo, YW
    Norton, DP
    Hebard, AF
    Budai, JD
    Park, YD
    THIN SOLID FILMS, 2005, 488 (1-2) : 194 - 199
  • [26] Surface and optical properties of films grown by radio frequency nanocrystalline anatase titania reactive magnetron sputtering
    Liu, FM
    Wang, TM
    APPLIED SURFACE SCIENCE, 2002, 195 (1-4) : 284 - 290
  • [27] Optical properties of cubic AlN films grown by sputtering
    Choudhary, R. K.
    Mishra, P.
    Hubli, R. C.
    SURFACE ENGINEERING, 2016, 32 (04) : 304 - 306
  • [28] MECHANICAL-PROPERTIES OF SICX FILMS BY REACTIVE SPUTTERING
    KAMATA, K
    SAITO, N
    HAYASHI, N
    TANABE, I
    MORIYAMA, M
    NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1990, 98 (02): : 156 - 160
  • [29] Properties of ITO films prepared by reactive magnetron sputtering
    Kleinhempel, Ronny
    Kaune, Gunar
    Herrmann, Matthias
    Kupfer, Hartmut
    Hoyer, Walter
    Richter, Frank
    MICROCHIMICA ACTA, 2006, 156 (1-2) : 61 - 67
  • [30] Properties of nickel oxide films by DC reactive sputtering
    Lee, M
    Seo, S
    Seo, D
    Jeong, E
    Yoo, IK
    INTEGRATED FERROELECTRICS, 2004, 68 : 19 - +
12345