Study on the influence mechanism of gate oxide degradation on DM EMI signals in SiC MOSFET

This paper investigates gate oxide degradation and its influence on Differential Mode(DM) EMI signals. The study reveals that changes in the parasitic capacitance within the chip, resulting from gate oxide degradation, can modify the amplitude-frequency characteristics of DM EMI signals, leading to unexpected transmission outcomes. This paper subjects SiC MOSFET modules to periodic high-temperature gate bias stress, extracts the spectrum characteristics of DM EMI, and assesses the impact of junction temperature. The analysis explores the impact of gate oxide degradation on low and high frequency DM EMI signals. Experimental results reveal distinct sensitivities of amplitude-frequency characteristics in the DM EMI signals to temperature variations and responses to gate oxide degradation at various frequency bands. The extrapolation of the correlation between the frequency-domain characteristics of the DM EMI signals and the degree of gate oxide degradation introduces a novel approach to evaluate the lifespan of power electronic devices.