High-quality temperature-complementary bulk acoustic wave resonators fabricated with strippable single-crystalline AlN films grown on sapphire

被引:0
|
作者
Luo, Tianyou [1 ]
Zhang, Yinuo [1 ]
Chen, Zhipeng [1 ]
Xu, Kaibin [1 ]
Ouyang, Peidong [1 ]
Hu, Han [1 ]
Li, Chenyang [1 ]
Zhu, Yuhan [1 ]
Yi, Xinyan [2 ]
Li, Guoqiang [1 ,2 ,3 ]
机构
[1] South China Univ Technol, State Key Lab Luminescent Mat & Devices, Guangzhou 510640, Peoples R China
[2] Guangzhou FLCT Commun Technol Co Ltd, Guangzhou 510700, Peoples R China
[3] Shanxi Zheda Inst Adv Mat & Chem Engn, Taiyuan 030032, Peoples R China
关键词
THICKNESS; EPILAYER; LAYER;
D O I
10.1063/5.0231483
中图分类号
O59 [应用物理学];
学科分类号
摘要
To satisfy the strict demands of 5G radio frequency communication, we propose high-quality, flexible temperature-compensated single-crystalline AlN film bulk acoustic wave resonators (TC-SABARs) based on a 6-inch sapphire substrate. An AlGaN sacrificial layer and a 600-nm-thick single-crystalline AlN epitaxial layer are deposited on a sapphire substrate by metal organic chemical vapor deposition (MOCVD). Two types of TC-SABARs are fabricated and their performances are compared with published results. The results indicate that one of the TC-SABARs has a maximum Bode Q of 3406, an effective coefficient ( K-eff(2)) of 6.21%, and a temperature coefficient of frequency (TCF) of -9.5 ppm/degrees C. The other TC-SABAR exhibits a maximum Bode Q of 3022, a K-eff(2) of 5.99%, and a TCF of +0.7 ppm/degrees C. This performance can be attributed to the high-quality single-crystalline AlN film and the temperature-compensation structure with nonmetallic flip-chip bonding film transfer process and a thick SiO2 layer.
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页数:9
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