Deposition of MSe (M = Cd, Zn) films by LP-MOCVD from novel single-source precursors M[(SePPh2)2N]2

被引:0
|
作者
Afzaal, Mohammad [1 ]
Aucott, Stephen M. [1 ]
Crouch, David [1 ]
O'Brien, Paul [1 ]
Woollins, J. Derek [1 ]
Park, Jin-Ho [1 ]
机构
[1] Manchester Materials Science Ctr., Department of Chemistry, University of Manchester, Oxford Road, Manchester, M13 9PL, United Kingdom
关键词
Glass - Polycrystalline materials - Scanning electron microscopy - Semiconducting cadmium compounds - Semiconducting zinc compounds - Stoichiometry - Thermogravimetric analysis - Thin films - X ray powder diffraction;
D O I
10.1002/1521-4095(20020205)14:33.0.CO;2-O
中图分类号
学科分类号
摘要
Communication: CdSe and ZnSe films have been deposited from novel single-source precursors M[(SePPh2)2N]2 (M = Cd or Zn) by LP-MOCVD. The precursors are air stable and start to evaporate at 375 °C. The CdSe and ZnSe films deposited on glass are polycrystalline and of hexagonal phase. Scanning electron microscopy reveals dense films (see Figure) and energy dispersive X-ray analysis indicates that the stoichiometry of the deposited films is close to 1:1.
引用
收藏
页码:187 / 189
相关论文
共 50 条
  • [21] Study of nanoalloys formation mechanism from single-source precursors [M(NH3)5Cl](ReO4)2, M = Rh, Ir
    Filatov, E. Yu.
    Shubin, Yu. V.
    Korenev, S. V.
    ZEITSCHRIFT FUR KRISTALLOGRAPHIE, 2007, : 283 - 288
  • [22] Single-source chemical vapor deposition growth of ZnO thin films using Zn4O(CO2NEt2)6
    Petrella, AJ
    Deng, H
    Roberts, NK
    Lamb, RN
    CHEMISTRY OF MATERIALS, 2002, 14 (10) : 4339 - 4342
  • [23] Bis(diphenylphosphino)amine and their dichalcogenide derivatives as ligands in rhodium(III), iridium(III), and ruthenium(II) complexes.: Crystal structures of [(η5-C5Me5)MCl{η2-(SePPh2)2N}] (M = Rh, Ir)
    Valderrama, M
    Contreras, R
    Lamata, MP
    Viguri, F
    Carmona, D
    Lahoz, FJ
    Elipe, S
    Oro, LA
    JOURNAL OF ORGANOMETALLIC CHEMISTRY, 2000, 607 (1-2) : 3 - 11
  • [24] Yellow luminescence mechanism and persistent photoconductivity in n-GaN single crystal films grown on α-Al2O3(0001) substrates by LP-MOCVD
    Wang, LS
    Yue, GZ
    Liu, XL
    Wang, XH
    Wang, CX
    Wang, D
    Lu, DC
    Wang, ZG
    BLUE LASER AND LIGHT EMITTING DIODES II, 1998, : 560 - 563
  • [25] Synthesis and characterization of polyether adducts of group 2 metal thioacetates: Single-source precursors to binary metal sulfide films, MS, where M=Ca, Sr, Ba
    Kunze, K
    Bihry, L
    Atanasova, P
    HampdenSmith, MJ
    Duesler, EN
    CHEMICAL VAPOR DEPOSITION, 1996, 2 (03) : 105 - &
  • [26] Synthesis and Characterization of Bimetallic Single-Source Precursors (Ph3P)2M(μ-SEt)2E(SEt)2 for MES2 Chalcopyrite Materials (M = Cu, Ag and E = In, Ga, Al)
    Margulieux, Kelsey R.
    Sun, Chivin
    Kihara, Matthew T.
    Colson, Adam C.
    Zakharov, Lev N.
    Whitmire, Kenton H.
    Holland, Andrew W.
    Pak, Joshua J.
    EUROPEAN JOURNAL OF INORGANIC CHEMISTRY, 2017, (13) : 2068 - 2077
  • [27] Low temperature, aerosol-assisted chemical vapor deposition (AACVD) of CdS, ZnS, and Cd1-xZnxS using monomeric single-source precursors: M(SOCCH3)(2)TMEDA
    Nyman, M
    HampdenSmith, MJ
    Duesler, EN
    CHEMICAL VAPOR DEPOSITION, 1996, 2 (05) : 171 - &
  • [28] 0.2 mu m T-gate InP/InGaAs/InP pHEMT with an InGaP diffusion barrier layer grown by LP-MOCVD using an N-2-carrier
    Schimpf, K
    Hollfelder, M
    Marso, M
    Horstmann, M
    Hardtdegen, H
    Kordos, P
    1996 54TH ANNUAL DEVICE RESEARCH CONFERENCE DIGEST, 1996, : 126 - 127
  • [29] 0.2 mu m T-gate InP/InGaAs/InP pHEMT with an InGaP diffusion barrier layer grown by LP-MOCVD using an N-2-carrier
    Schimpf, K
    Hollfelder, M
    Horstmann, M
    Marso, M
    Hardtdegen, H
    Kordos, P
    1996 EIGHTH INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS, 1996, : 666 - 669
  • [30] A CLASS OF SINGLE-SOURCE PRECURSORS TO TITANIUM DISULFIDE FILMS - SYNTHESIS, STRUCTURE, AND CHEMICAL-VAPOR-DEPOSITION STUDIES OF [TICL4(HSR)2]
    WINTER, CH
    LEWKEBANDARA, TS
    PROSCIA, JW
    RHEINGOLD, AL
    INORGANIC CHEMISTRY, 1993, 32 (18) : 3807 - 3808