Fabrication of sub-micron structures with high aspect ratio for MEMS using deep X-ray lithography

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作者：
Ueno, Hiroshi [1 ]
Nishi, Nobuyoshi [1 ]
Sugiyama, Susumu [1 ]
机构：
[1] Ritsumeikan Univ, Shiga, Japan
来源：
Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS) | 2000年
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页码：596 / 601
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