Study of Si and Ge growth on Si(100) surface

被引:0
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作者
Wang, Lei [1 ]
Tang, Jingchang [1 ]
Yang, Deren [1 ]
Wang, Xuesen [1 ]
Hu, Yanfang [1 ]
机构
[1] Lab. of Silicon Mat., Dept. of Phys., Zhejiang Univ., Hangzhou 310027, China
关键词
Germanium - Scanning tunneling microscopy - Silicon - Surface structure;
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摘要
Utilizing scanning tunneling microscope and UHV system, the growth of Si and Ge on Si(100) surface have been investigated. The morphological and structural properties of the surfaces are studies. A nano-patterned Si film can be produced by homoepitaxy on Si(100). The growth of Ge on Si(100) will form regular 3D islands. On the multilayer film of Si/Ge/Si(100), the Ge will form regular small and big is lands. The big islands are probably stabilized by a Ge/Si/Ge shell structure.
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页码:104 / 106
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