共 50 条
- [21] Universal threshold for the steam laser cleaning of submicron spherical particles from silicon APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2000, 70 (06): : 669 - 672
- [23] Laser removal of foreign materials from semiconductor wafers LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING III, 1998, 3274 : 90 - 99
- [24] Analyses of laser-assisted removal of adhering particles from silicon surfaces New Vistas in Dusty Plasmas, 2005, 799 : 518 - 521
- [25] Polarized light scattering from metallic particles on silicon wafers OPTICAL METROLOGY ROADMAP FOR THE SEMICONDUCTOR, OPTICAL, AND DATA STORAGE INDUSTRIES II, 2001, 4449 : 281 - 290
- [27] INSITU REMOVAL OF NATIVE OXIDE FROM SILICON-WAFERS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (04): : 656 - 657
- [28] Discrimination of particles and defects on silicon wafers Microelectronic Engineering, 1999, 45 (02): : 191 - 196
- [30] Pulsed laser induced annealing and spin-on-doping in silicon wafers ICSE '96 - 1996 IEEE INTERNATIONAL CONFERENCE ON SEMICONDUCTOR ELECTRONICS, PROCEEDINGS, 1996, : 85 - 88