Effects of magnetic field on pulse wave forms in plasma immersion ion implantation in a radio-frequency, inductively coupled plasma

被引：0
|
作者：
Tong, Honghui [1 ,2 ]
Fu, Ricky K. Y. [1 ]
Tang, Deli [1 ,2 ]
Zeng, Xuchu [1 ]
Chu, Paul K. [1 ]
机构：
[1] [1,Tong, Honghui
[2] Fu, Ricky K. Y.
[3] 1,Tang, Deli
[4] Zeng, Xuchu
[5] Chu, Paul K.
来源：
Tong, H. | 1600年 / American Institute of Physics Inc.卷 / 92期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Effects of magnetic field on oxide etching characteristics in planar type radio frequency inductively coupled plasma
    Lee, HJ
    Kim, JH
    Whang, KW
    Joo, JH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1996, 14 (03): : 1007 - 1010
  • [22] The radio frequency magnetic field effect on electron heating in a low frequency inductively coupled plasma
    Chung, C
    Seo, SH
    Chang, HY
    PHYSICS OF PLASMAS, 2000, 7 (09) : 3584 - 3587
  • [23] Enhanced radio frequency field penetration in an inductively coupled plasma
    Tuszewski, M
    PHYSICAL REVIEW LETTERS, 1996, 77 (07) : 1286 - 1289
  • [24] Transient Response of Radio Frequency Inductively Coupled Plasma for Pulse Modulation
    K. C. Paul
    J. Mostaghimi
    T. Ishigaki
    T. Sakuta
    Plasma Chemistry and Plasma Processing, 2001, 21 : 371 - 400
  • [25] Plasma recovery in plasma immersion ion implantation: dependence on pulse frequency and duty cycle
    Briehl, B
    Urbassek, HM
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2002, 35 (05) : 462 - 467
  • [26] Transient response of radio frequency inductively coupled plasma for pulse modulation
    Paul, KC
    Mostaghimi, J
    Ishigaki, T
    Sakuta, T
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2001, 21 (03) : 371 - 400
  • [27] Effects of strong magnetic field on plasma immersion ion implantation of dielectric substrates
    Ghomi, Hamid
    Ghasemkhani, Mohammadreza
    VACUUM, 2009, 83 (12) : 1427 - 1430
  • [28] Radio-frequency plasma nitriding and nitrogen plasma immersion ion implantation of Ti-6Al-4V alloy
    Wang, SY
    Chu, PK
    Tang, BY
    Zeng, XC
    Chen, YB
    Wang, XF
    SURFACE & COATINGS TECHNOLOGY, 1997, 93 (2-3): : 309 - 313
  • [29] Effects of impedance matching network on the discharge mode transitions in a radio-frequency inductively coupled plasma
    Ding, Z. F.
    Yuan, G. Y.
    Gao, W.
    Sun, J. C.
    PHYSICS OF PLASMAS, 2008, 15 (06)
  • [30] Phase shift effects of radio-frequency bias on ion energy distribution in continuous wave and pulse modulated inductively coupled plasmas
    Xue, Chan
    Gao, Fei
    Liu, Yong-Xin
    Liu, Jia
    Wang, You-Nian
    CHINESE PHYSICS B, 2018, 27 (04)
12345