Fabrication of heterostructured α-Fe2O3 / ZnO film for photoelectrode by aqueous solution process

被引：0

作者：

Hong, J.S. ^{[1
]}

Watanabe, T. ^{[1
]}

Wagata, H. ^{[2
]}

Katsumata, K. ^{[1
]}

Okada, K. ^{[1
]}

Matsushita, N. ^{[1
]}

机构：

[1] Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama,226-8503, Japan

[2] Department of Environmental Science and Technology, Shinshu University, Nagano,380-8533, Japan

来源：

Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy | 2014年 / 61卷

关键词：

Double-layered films - Glass substrates - Heterostructured films - High transmittance - Low resistivity - Photoelectrode - Solution process - Visible range;

D O I：

10.2497/jjspm.61.S324

中图分类号：

学科分类号：

摘要：

Heterostructured α-Fe2O3 / ZnO films were fabricated by using spin-spray method and properties of each layer and heterostructured α-Fe2O3 / ZnO film were investigated. First, as-deposited ZnO layer on glass substrate exhibited high transmittance of above 80 % in visible range and a low resistivity of 1.8 × 10-2 Ω;·cm. The formation of α-Fe2O3 layer on glass substrate was confirmed by XRD. This α-Fe2O3 layer was successively deposited on ZnO layer and it was confirmed that heterostructured α-Fe2O3 / ZnO double layered films could be fabricated by aqueous solution process. © 2014, Journal of the Japan Society of Powder and Powder Metallurgy. All rights reserved.

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