Investigation of compatibility of ferroelectric capacitor fabrication process with standard CMOS fabrication process

被引：0

作者：

Zhai, Ya-Hong ^{[1
]}

Li, Ping ^{[1
]}

Zhang, Shu-Ren ^{[1
]}

Yang, Cheng-Tao ^{[1
]}

Ruan, Ai-Wu ^{[1
]}

Cai, Dao-Lin ^{[1
]}

Ouyang, Fan ^{[1
]}

Chen, Yan-Yu ^{[1
]}

机构：

[1] State Key Lab. of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China

来源：

| 2007年 / Sichuan Institute of Piezoelectric and Acoustooptic Technology, Yongchuan Chongqing, 632164, China卷 / 29期

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D O I：

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中图分类号：

学科分类号：

摘要：

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