共 50 条
- [1] Fundamentals of post-CMP cleaning ADVANCES AND CHALLENGES IN CHEMICAL MECHANICAL PLANARIZATION, 2007, 991 : 53 - 64
- [2] POST-CMP CLEANING APPLICATIONS PROCEEDINGS OF THE STLE/ASME INTERNATIONAL JOINT TRIBOLOGY CONFERENCE 2008, 2009, : 719 - 720
- [5] Influence of post-CMP cleaning on Cu surface ADVANCES AND CHALLENGES IN CHEMICAL MECHANICAL PLANARIZATION, 2007, 991 : 71 - +
- [6] Post-CMP cleaning using acoustic streaming Journal of Electronic Materials, 1998, 27 : 1095 - 1098
- [8] A MODEL FOR POST-CMP CLEANING EFFECT ON TDDB 2011 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS), 2011,
- [9] A novel design of brush scrubbing in post-CMP cleaning INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE, 2014, 85 : 30 - 35
- [10] Yield enhancement through understanding the particle adhesion and removal mechanisms in CMP and post-CMP cleaning processes 2000 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP, 2000, : 14 - 17