Electron energy distributions in inductively coupled plasma: Comparison of chlorine discharge with argon discharge
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Yonemura, Shigeru
[1
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Nanbu, Kenichi
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Institute of Fluid Science, Tohoku University, Sendai 980-8577, JapanInstitute of Fluid Science, Tohoku University, Sendai 980-8577, Japan
Nanbu, Kenichi
[1
]
Sakai, Kazuma
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Institute of Fluid Science, Tohoku University, Sendai 980-8577, JapanInstitute of Fluid Science, Tohoku University, Sendai 980-8577, Japan
Sakai, Kazuma
[1
]
机构:
[1] Institute of Fluid Science, Tohoku University, Sendai 980-8577, Japan
来源:
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2002年
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Japan Society of Applied Physics卷
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41期
关键词:
Argon - Chlorine - Computer simulation - Electric discharges - Electron energy levels - Maxwell equations - Monte Carlo methods - Numerical analysis - Temperature distribution;
D O I:
10.1143/jjap.41.6189
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摘要:
The characteristics of the electron energy distribution functions (EEDFs) in inductively-coupled discharges of chlorine and argon gases are studied numerically. The EEDFs in atomic gases such as Ar and Cl show the three-temperature distribution with depletion in the high-energy region and enhancement in the low-energy region. By contrast, the EEDF for Cl2 shows the bi-Maxwellian distribution close to the Maxwellian one. The reason for this difference is explained by the difference of electronic inelastic collision cross sections between atomic and molecular gases. The EEDFs obtained in the present simulation agree with the earlier experimental results qualitatively.
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Zhongyuan Univ Technol, Text & Garment Ind Res Inst, Zhengzhou 450007, Peoples R ChinaZhongyuan Univ Technol, Text & Garment Ind Res Inst, Zhengzhou 450007, Peoples R China
Sun, Xiao-Yan
Zhang, Yu-Ru
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Dalian Univ Technol, Sch Phys, Key Lab Mat Modificat Laser Ion & Elect Beams, Minist Educ, Dalian 116024, Peoples R ChinaZhongyuan Univ Technol, Text & Garment Ind Res Inst, Zhengzhou 450007, Peoples R China
Zhang, Yu-Ru
Chai, Sen
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China Special Equipment Inspect & Res Inst, Beijing 100029, Peoples R ChinaZhongyuan Univ Technol, Text & Garment Ind Res Inst, Zhengzhou 450007, Peoples R China
Chai, Sen
Wang, You-Nian
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Dalian Univ Technol, Sch Phys, Key Lab Mat Modificat Laser Ion & Elect Beams, Minist Educ, Dalian 116024, Peoples R ChinaZhongyuan Univ Technol, Text & Garment Ind Res Inst, Zhengzhou 450007, Peoples R China
Wang, You-Nian
Chu, Yan-Yan
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Zhongyuan Univ Technol, Text & Garment Ind Res Inst, Zhengzhou 450007, Peoples R ChinaZhongyuan Univ Technol, Text & Garment Ind Res Inst, Zhengzhou 450007, Peoples R China
Chu, Yan-Yan
He, Jian-Xin
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Zhongyuan Univ Technol, Text & Garment Ind Res Inst, Zhengzhou 450007, Peoples R ChinaZhongyuan Univ Technol, Text & Garment Ind Res Inst, Zhengzhou 450007, Peoples R China