Formation of microstructure in SiO2 thin film by a femtosecond laser pulse

被引：0
|
作者：
Kawamura, Ken-Ichi [1 ,2 ]
Motomitsu, Eiji [1 ]
Hirano, Masahiro [1 ]
Hosono, Hideo [1 ]
机构：
[1] Hosono Transparent Electro-Active Materials (TEAM) Project, ERATO, Japan Science and Technology Corporation, Sakato 3-2-1, Takatsu-ku, Kawasaki 213-0012, Japan
[2] Materials and Structures Laboratory, Tokyo Institute of Technology, Midori-ku, Yokohama 226-8503, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2002年 / 41卷 / 6 B期
关键词：
D O I：
10.1143/jjap.41.4400
中图分类号：
学科分类号：
摘要：
17
引用
收藏
页码：4400 / 4403
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