Experimental evaluation of inductively coupled plasma deep silicon etching

被引：0
|
作者：
Xu, Gaobin [1 ]
Huang, Hua [1 ]
Zhan, Minghao [1 ,2 ]
Huang, Xiaoli [2 ]
Wang, Wenjing [2 ]
Hu, Xiao [1 ]
Chen, Xing [1 ]
机构：
[1] Xu, Gaobin
[2] Huang, Hua
[3] 1,Zhan, Minghao
[4] Huang, Xiaoli
[5] Wang, Wenjing
[6] Hu, Xiao
[7] Chen, Xing
来源：
Xu, G. (gbxu@hfut.edu.cn) | 1600年 / Science Press, 18,Shuangqing Street,Haidian, Beijing, 100085, China卷 / 33期
关键词：
Inductively coupled plasma;
D O I：
10.3969/j.issn.1672-7126.2013.08.21
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：832 / 835
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