Experimental evaluation of inductively coupled plasma deep silicon etching

被引：0

作者：

Xu, Gaobin ^{[1
]}

Huang, Hua ^{[1
]}

Zhan, Minghao ^{[1
,2
]}

Huang, Xiaoli ^{[2
]}

Wang, Wenjing ^{[2
]}

Hu, Xiao ^{[1
]}

Chen, Xing ^{[1
]}

机构：

[1] Xu, Gaobin

[2] Huang, Hua

[3] 1,Zhan, Minghao

[4] Huang, Xiaoli

[5] Wang, Wenjing

[6] Hu, Xiao

[7] Chen, Xing

来源：

Xu, G. (gbxu@hfut.edu.cn) | 1600年 / Science Press, 18,Shuangqing Street,Haidian, Beijing, 100085, China卷 / 33期

关键词：

Inductively coupled plasma;

D O I：

10.3969/j.issn.1672-7126.2013.08.21

中图分类号：

学科分类号：

摘要：

引用

页码：832 / 835

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