Exposure method using photoresist mask for high-density optical disk mastering

被引：0
|
作者：
Shimizu, Akihiko [1 ]
Endo, Hideyasu [1 ]
Watanabe, Hisao [1 ]
Obara, Takashi [1 ]
Miyata, Hiroyuki [1 ]
Mizuta, Osamu [1 ]
Takeuchi, Koji [1 ]
Kudo, Yuzuru [1 ]
Hashiguchi, Tsuyoshi [1 ]
机构：
[1] OD Development Center, Research and Development Group, Ricoh Company, Ltd., 1005 Shimo-Ogino, Atsugi, Kanagawa, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2000年 / 39卷 / 2 B期
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摘要：
2
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页码：806 / 807
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