Exposure method using photoresist mask for high-density optical disk mastering

被引：0

作者：

Shimizu, Akihiko ^{[1
]}

Endo, Hideyasu ^{[1
]}

Watanabe, Hisao ^{[1
]}

Obara, Takashi ^{[1
]}

Miyata, Hiroyuki ^{[1
]}

Mizuta, Osamu ^{[1
]}

Takeuchi, Koji ^{[1
]}

Kudo, Yuzuru ^{[1
]}

Hashiguchi, Tsuyoshi ^{[1
]}

机构：

[1] OD Development Center, Research and Development Group, Ricoh Company, Ltd., 1005 Shimo-Ogino, Atsugi, Kanagawa, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2000年 / 39卷 / 2 B期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：806 / 807

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