Electron-beam deposition of a thin-film magneto-dielectric iron and alumina based coating by a fore-vacuum plasma electron source

被引:0
|
作者
Zolotukhin D.B. [1 ]
Tyunkov A.V. [1 ]
Frolova V.P. [1 ,2 ]
Yushkov Yu.G. [1 ,2 ]
机构
[1] Tomsk State University of Control Systems and Radioelectronics, 40 Lenin Ave., Tomsk
[2] Institute of High Current Electronics SB RAS, 2/3 Academichesky Ave., Tomsk
来源
Applied Physics | 2023年 / 01期
关键词
beam plasma; fore-vacuum plasma electron sources; magneto-dielectric coatings;
D O I
10.51368/1996-0948-2023-1-61-65
中图分类号
学科分类号
摘要
The results of an experiment on a thin-film magneto-dielectric coating deposition under successive electron-beam radiation in helium and oxygen at a fore-vacuum pressure (5 Pa) of samples made of steel and alumina ceramics are described. The presence of a coating of magnetic properties was demonstrated by the method of ferromagnetic resonance, the X-ray study confirmed the presence of a coating of Fe3O4 magnetic oxide, and the coatings measured by an optical profilometer were 3–6 μm. © 2023 Federal Informational-Analytical Center of the Defense Industry. All rights reserved.
引用
收藏
页码:61 / 65
页数:4
相关论文
共 36 条
  • [21] Optimization of a plasma focus device as an electron beam source for thin film deposition
    Zhang, T.
    Lin, J.
    Patran, A.
    Wong, D.
    Hassan, S. M.
    Mahmood, S.
    White, T.
    Tan, T. L.
    Springham, S. V.
    Lee, S.
    Lee, P.
    Rawat, R. S.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2007, 16 (02): : 250 - 256
  • [22] Electron beam deposition of silicon-oxycarbonitride films in a nitrogen-containing hollow cathode discharge plasma in the fore-vacuum pressure range
    Burdovitsin, V. A.
    Andronov, A. A.
    Klimov, A. S.
    Kiki, L. J. Ngon A.
    Oks, E. M.
    Sukhovolsky, F. A.
    THIN SOLID FILMS, 2025, 815
  • [23] Effect of deposition temperature on electron-beam evaporated polycrystalline silicon thin-film and crystallized by diode laser
    Yun, J.
    Varalmov, S.
    Huang, J.
    Kim, K.
    Green, M. A.
    APPLIED PHYSICS LETTERS, 2014, 104 (24)
  • [24] DIELECTRIC THIN-FILM DEPOSITION BY ELECTRON-CYCLOTRON-RESONANCE PLASMA CHEMICAL-VAPOR-DEPOSITION FOR OPTOELECTRONICS
    DZIOBA, S
    ROUSINA, R
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (01): : 433 - 440
  • [25] INVESTIGATION OF CURRENT CHARACTERISTICS OF THIN-FILM STRUCTURES BASED ON GAP UNDER THE ACTION OF AN ELECTRON-BEAM
    RUBINOV, VM
    TUYCHIEV, M
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1982, 69 (01): : K113 - K116
  • [26] Thin film deposition and characterization of pure and iron-doped electron-beam evaporated tungsten oxide for gas sensors
    Tesfamichael, Tuquabo
    Arita, Masashi
    Bostrom, Thor
    Bell, John
    THIN SOLID FILMS, 2010, 518 (17) : 4791 - 4797
  • [27] Micrometer-scale amorphous Si thin-film electrodes fabricated by electron-beam deposition for Li-ion batteries
    Yin, JT
    Wada, M
    Yamamoto, K
    Kitano, Y
    Tanase, S
    Sakai, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2006, 153 (03) : A472 - A477
  • [28] A study on the radiation resistance of CdWO4 thin-film scintillators deposited by using an electron-beam physical vapor deposition method
    Park, Seyong
    Yoon, Young Soo
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2016, 69 (05) : 734 - 738
  • [29] Effect of deposition temperature on electron-beam evaporated polycrystalline silicon thin-film and crystallized by diode laser (vol 104, 242102, 2014)
    Yun, J.
    Varlamov, S.
    Huang, J.
    Kim, K.
    Green, M. A.
    APPLIED PHYSICS LETTERS, 2015, 106 (25)
  • [30] A study on the radiation resistance of CdWO4 thin-film scintillators deposited by using an electron-beam physical vapor deposition method
    Seyong Park
    Young Soo Yoon
    Journal of the Korean Physical Society, 2016, 69 : 734 - 738