共 50 条
- [41] Effects of grain size and abrasive size of polyerystalline nano-particle ceria slurry on shallow trench isolation chemical mechanical polishing JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2004, 43 (3A): : L365 - L368
- [42] Effects of abrasive size and surfactant concentration on the non-prestonian behavior of ceria slurry in shallow trench isolation chemical mechanical polishing JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2005, 44 (1-7): : L136 - L139
- [43] Nanotopography impact and non-prestonian Behavior of ceria slurry in shallow trench isolation chemical mechanical polishing (STI-CMP) JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2004, 43 (2A): : L217 - L220
- [44] Nanotopography Impact and Non-Prestonian Behavior of Ceria Slurry in Shallow Trench Isolation Chemical Mechanical Polishing (STI-CMP) Japanese Journal of Applied Physics, Part 2: Letters, 2004, 43 (2 A):
- [45] Effects of abrasive size and surfactant concentration on the non-Prestonian behavior of ceria slurry in shallow trench isolation chemical mechanical polishing Japanese Journal of Applied Physics, Part 2: Letters, 2005, 44 (1-7):
- [46] Effects of the physical characteristics of cerium oxide on plasma-enhanced tetraethylorthosiliate removal rate of chemical mechanical polishing for shallow trench isolation JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (03): : 1227 - 1230
- [47] Effects of the physical characteristics of cerium oxide on plasma-enhanced tetraethylorthosiliate removal rate of chemical mechanical polishing for shallow trench isolation Kim, S.-K. (upaik@hanyang.ac.kr), 1600, Japan Society of Applied Physics (42): : 1227 - 1230
- [48] Mechanism of chemical mechanical polishing process for oxide-filled shallow trench isolation applications CHEMICAL MECHANICAL PLANARIZATION I: PROCEEDINGS OF THE FIRST INTERNATIONAL SYMPOSIUM ON CHEMICAL MECHANICAL PLANARIZATION, 1997, 96 (22): : 36 - 46
- [49] Nanotopography impact in shallow trench isolation chemical mechanical polishing-dependence on slurry characteristics JOURNAL OF RARE EARTHS, 2004, 22 : 1 - 4