共 50 条
- [1] The effect of cerium precursor agglomeration on the synthesis of ceria particles and its influence on shallow trench isolation chemical mechanical polishing performance JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (12): : 8422 - 8426
- [2] Effect of calcination process on synthesis of ceria particles, and its influence on shallow trench isolation chemical mechanical planarization performance JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (6A): : 4893 - 4897
- [3] Influence of physical characteristics of ceria particles on polishing rate of chemical mechanical planarization for shallow trench isolation JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (11A): : 7427 - 7433
- [7] Photoresist chemical mechanical polishing for shallow trench isolation JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (4A): : 1697 - 1700
- [8] Photoresist chemical mechanical polishing for shallow trench isolation Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1998, 37 (4 A): : 1697 - 1700
- [9] Effect of ionic surfactants on shallow trench isolation for chemical mechanical polishing using ceria-based slurries COGENT ENGINEERING, 2023, 10 (02):