Striation Phenomena in a Radio Frequency Capacitively Coupled Plasma for Semiconductor Process

被引：0
|
作者：
Park G. [1 ]
Lee H.J. [1 ]
机构：
[1] Dept. of Electrical Engineering, Pusan National University
来源：
Transactions of the Korean Institute of Electrical Engineers | 2022年 / 71卷 / 02期
关键词：
Capacitively coupled plasmas; Particle-in-cell simulation; Pattern formation; Striation;
D O I：
10.5370/KIEE.2022.71.2.402
中图分类号：
学科分类号：
摘要：
This study provides the conditions and characteristics of a radial striation in a capacitively coupled plasmas, which is caused by self-organized pattern formation. With the variation of the gas pressure and the RF applied voltage, we found that the striation occurs in the parameter space near the breakdown boundary of the glow discharge. By observing the time-averaged plasma parameters, it was found that the striation is triggered by the local non-uniformity of electron heating. The radial electron flux distribution shows a strong shear with the evolving striations. Copyright © 2022 The Korean Institute of Electrical Engineers.
引用
收藏
页码：402 / 405
页数：3
相关论文
共 50 条
  • [21] Low power radio frequency capacitively coupled plasma in air ... An alternative spectral source?
    Anghel, SD
    Simon, A
    Frentiu, T
    Cordos, EA
    SIOEL '99: SIXTH SYMPOSIUM ON OPTOELECTRONICS, 2000, 4068 : 776 - 785
  • [22] Studies on the effect of finite geometrical asymmetry in dual capacitively coupled radio frequency plasma
    Bora, B.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2015, 24 (05):
  • [23] Adhesion enhancement of polyethylene modified by capacitively coupled radio frequency plasma polymerization of ethanol
    Li, Y. P.
    Zhang, Z. C.
    Shi, W.
    Lei, M. K.
    SURFACE & COATINGS TECHNOLOGY, 2014, 259 : 77 - 82
  • [24] Diamond synthesis by capacitively coupled radio frequency plasma with the addition of direct current power
    Appl Phys Lett, 26 (3972):
  • [25] Characterization of Capacitively Coupled Radio-frequency Argon Plasma by Electrical Circuit Simulation
    Bora, B.
    Bhuyan, H.
    Favre, M.
    Wyndham, E.
    Chuaqui, H.
    MECHANICAL AND AEROSPACE ENGINEERING, PTS 1-7, 2012, 110-116 : 5373 - 5379
  • [26] Influences of electrode configurations in dual capacitively coupled radio frequency glow discharge plasma
    Bora, B.
    Soto, L.
    15TH LATIN AMERICAN WORKSHOP ON PLASMA PHYSICS (LAWPP 2014) AND 21ST IAEA TM ON RESEARCH USING SMALL FUSION DEVICES (RUSFD), 2015, 591
  • [27] Diamond synthesis by capacitively coupled radio frequency plasma with the addition of direct current power
    Chattopadhyay, KK
    Matsumoto, S
    APPLIED PHYSICS LETTERS, 1995, 67 (26) : 3972 - 3974
  • [28] Study of dual radio frequency capacitively coupled plasma: an analytical treatment matched to an experiment
    Saikia, P.
    Bhuyan, H.
    Escalona, M.
    Favre, M.
    Wyndham, E.
    Maze, J.
    Schulze, J.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2018, 27 (01):
  • [29] Characteristics of a hybrid radio frequency capacitively and inductively coupled plasma using hydrogen gas
    Ohtsu, Yasunori
    Tabaru, Tatsuo
    Schulze, Julian
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2024, 42 (04):
  • [30] ELECTRICAL CHARACTERISTICS OF PLASMA LOADED, RADIO-FREQUENCY DRIVEN, CAPACITIVELY COUPLED ELECTRODES
    FORSTER, J
    APPLIED PHYSICS LETTERS, 1993, 62 (26) : 3429 - 3431
12345