Construction of diabatic potential energy surfaces for the SiH2+ system and dynamics studies of the Si+(2P1/2, 3/2) + H2 reaction

被引:0
|
作者
Li, Wentao [1 ]
Liang, Yongping [1 ]
Niu, Xianghong [2 ]
He, Di [1 ]
Xing, Wei [3 ]
Zhang, Yong [4 ]
机构
[1] Weifang Univ Sci & Technol, Weifang 262700, Shouguang, Peoples R China
[2] Nanjing Univ Posts & Telecommun, Sch Sci, Nanjing 210003, Peoples R China
[3] Xinyang Normal Univ, Coll Phys & Elect Engn, Xinyang 464000, Peoples R China
[4] Tonghua Normal Univ, Dept Phys, Tonghua, Jilin, Peoples R China
来源
JOURNAL OF CHEMICAL PHYSICS | 2024年 / 161卷 / 04期
关键词
LYING ELECTRONIC STATES; THRESHOLD BEHAVIOR; BASIS-SETS;
D O I
10.1063/5.0219621
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The construction of diabatic potential energy surfaces (PESs) for the SiH2+ system, related to the ground (1(2)A ') and excited states (2(2)A '), has been successfully achieved. This was accomplished by utilizing high-level ab initio energy points, employing a neural network fitting method in conjunction with a specifically designed function. The newly constructed diabatic PESs are carefully examined for dynamics calculations of the Si+(P-2(1/2, 3/2)) + H-2 reaction. Through time-dependent quantum wave packet calculations, the reaction probabilities, integral cross sections (ICSs), and differential cross sections (DCSs) of the Si+(P-2(1/2, 3/2)) + H-2 reaction were reported. The dynamics results indicate that the total ICS is in excellent agreement with experimental data within the collision energy range studied. The results also indicate that the SiH+ ion is hardly formed via the Si+(P-2(3/2)) + H-2 reaction. The results from the DCSs suggest that the "complex-forming" reaction mechanism predominates in the low collision energy region. Conversely, the forward abstraction reaction mechanism is dominant in the high collision energy region.
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页数:12
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