Reducing the power consumption of two-dimensional logic transistors

被引:0
|
作者
Weisheng Li
Hongkai Ning
Zhihao Yu
Yi Shi
Xinran Wang
机构
[1] NationalLaboratoryofSolidStateMicrostructures,SchoolofElectronicScienceandEngineeringandCollaborativeInnovationCenterofAdvancedMicrostructures,NanjingUniversity
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中图分类号
TN386 [场效应器件];
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摘要
The growing demand for high-performance logic transistors has driven the exponential rise in chip integration, while the transistors have been rapidly scaling down to sub-10 nm. The increasing leakage current and subthreshold slope(SS) induced by short channel effect(SCE) result in extra heat dissipation during device operation. The performance of electronic devices based on two-dimensional(2D) semiconductors such as the transition metal dichalcogenides(TMDC) can significantly reduce power consumption, benefiting from atomically thin thickness. Here, we discuss the progress of dielectric integration of 2D metal–oxide–semiconductor field effect transistors(MOSFETs) and 2D negative capacitance field effect transistors(NCFETs), outlining their potential in low-power applications as a technological option beyond scaled logic switches. Above all, we show our perspective at 2D low-power logic transistors, including the ultra-thin equivalent oxide thickness(EOT), reducing density of interface trap, reliability, operation speed etc. of 2D MOSFETs and NCFETs.
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页码:29 / 34
页数:6
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