INVOLVEMENT OF OXYGEN-VACANCY DEFECTS IN ENHANCING OXYGEN DIFFUSION IN SILICON

被引:42
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作者
OATES, AS [1 ]
NEWMAN, RC [1 ]
机构
[1] JJ THOMSON PHYS LAB,READING RG6 2AF,ENGLAND
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D O I
10.1063/1.97190
中图分类号
O59 [应用物理学];
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页码:262 / 264
页数:3
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