EFFECT OF ELECTRON-BEAM ORBIT DISTORTION ON OPTICAL-PERFORMANCE OF THE SYNCHROTRON-RADIATION LITHOGRAPHY BEAMLINE

被引:2
|
作者
SHIMANO, H
ASANO, K
OZAKI, Y
MATSUI, Y
机构
[1] Semiconductor Research Laboratory, Mitsubishi Electric Corporation, Amagasaki, Hyogo, 66l
关键词
SR LITHOGRAPHY; BEAMLINE; COD; ELECTRON BEAM MONITOR;
D O I
10.1143/JJAP.33.6888
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated the effect of the synchrotron radiation (SR) source drifts, namely, the source position and emission angle, caused by electron beam closed orbit distortion (GOD) on optical performance of the beamline such as the exposure field size, the illumination intensity and the uniformity. We theoretically derived that SR source drifts should be controlled within +/-0.4 mm and +/-0.2 mrad for the position and emission angle drifts, respectively, to obtain uniformity better than 15% for our beamline. We also propose a new technique to directly measure the SR source drifts using the focusing property of the mirror and the SR beam monitor installed in the beamline, which can be applied to predict the changes of optical performance of the beamline, and to monitor the electron beam drifts for correcting COD.
引用
收藏
页码:6888 / 6893
页数:6
相关论文
共 50 条
  • [41] Proximity effect correction in projection electron beam lithography (scattering with angular limitation projection electron-beam lithography)
    Liddle, JA
    Watson, GP
    Berger, SD
    Miller, PD
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (12B): : 6672 - 6678
  • [42] Proximity effect correction in projection electron beam lithography (scattering with angular limitation projection electron-beam lithography)
    Liddle, J.Alexander
    Watson, G.Patrick
    Berger, Steven D.
    Miller, Peter D.
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1995, 34 (12 B): : 6672 - 6678
  • [43] IMAGE AMPLIFICATION IN ELECTRON-BEAM LITHOGRAPHY BY RADIATION-INDUCED GRAFTING
    LIU, WT
    MOORE, JA
    CORELLI, JC
    BOURGEOIS, M
    STECKL, AJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (08) : C319 - C319
  • [44] PICOSECOND ELECTRON-BEAM AND SYNCHROTRON RADIATION PULSE-RADIOLYSIS FOR STUDIES ON ELECTRON-BEAM AND X-RAY RESISTS
    YOSHIDA, Y
    SHIBATA, H
    TAGAWA, S
    WASHIO, M
    TABATA, Y
    KOUCHI, N
    OGATA, A
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING VI, 1989, 1086 : 274 - 281
  • [45] EFFECT OF ELECTRON-BEAM CURRENT ON RADIATION PRETREATMENT OF CELLULOSIC WASTES WITH ELECTRON-BEAM ACCELERATOR
    KUMAKURA, M
    KAETSU, I
    RADIATION PHYSICS AND CHEMISTRY, 1984, 23 (05): : 523 - 527
  • [46] POLARIZATION OF COHERENT SYNCHROTRON RADIATION FROM AN ELECTRON-BEAM ROTATING IN A PLASMA
    TZACH, D
    BUSCHAUER, R
    BENFORD, G
    INTERNATIONAL JOURNAL OF INFRARED AND MILLIMETER WAVES, 1981, 2 (01): : 71 - 82
  • [47] PROXIMITY EFFECT CORRECTION IN VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY
    CHEN, AS
    NEUREUTHER, AR
    PAVKOVICH, JM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 148 - 152
  • [48] Study of x-ray lithography mask distortion during electron-beam writing
    Shang Hongyan
    Wang Yongkun
    SEVENTH INTERNATIONAL SYMPOSIUM ON INSTRUMENTATION AND CONTROL TECHNOLOGY: OPTOELECTRONIC TECHNOLOGY AND INSTUMENTS, CONTROL THEORY AND AUTOMATION, AND SPACE EXPLORATION, 2008, 7129
  • [49] POLYIMIDE OPTICAL WAVE-GUIDES FABRICATED WITH ELECTRON-BEAM LITHOGRAPHY
    ROOKS, MJ
    ROUSSELL, HV
    JOHNSON, LM
    APPLIED OPTICS, 1990, 29 (27): : 3880 - 3882
  • [50] COMPARISON OF ELECTRON-BEAM AND OPTICAL PROJECTION LITHOGRAPHY IN THE REGION OF ONE MICROMETER
    CHANG, TS
    KYSER, DF
    TING, CH
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1981, 275 : 117 - 121