共 50 条
- [22] RESIST HEATING EFFECT IN ELECTRON-BEAM LITHOGRAPHY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (03): : 1362 - 1366
- [23] PROXIMITY EFFECT CORRECTION IN ELECTRON-BEAM LITHOGRAPHY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1279 - 1285
- [24] ELECTRON-OPTICAL PERFORMANCE OF ELECTRON-BEAM LITHOGRAPHY COLUMNS PREDICTED BY A SIMPLE-MODEL JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (01): : 98 - 103
- [25] Performance of the Raith 150 electron-beam lithography system JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (06): : 2499 - 2503
- [26] Electron-beam lithography: Resist requirements and performance. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2001, 222 : U248 - U248
- [29] COHERENT SYNCHROTRON RADIATION FROM AN INTENSE RELATIVISTIC ELECTRON-BEAM BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1973, 18 (10): : 1354 - 1354
- [30] COHERENT CORRECTIONS TO THE SYNCHROTRON RADIATION SPECTRUM OF A RELATIVISTIC ELECTRON-BEAM PHYSICS OF FLUIDS B-PLASMA PHYSICS, 1993, 5 (01): : 164 - 170