INP/IN0.53GA0.47AS HETEROJUNCTION PHOTOTRANSISTORS GROWN BY CHEMICAL BEAM EPITAXY

被引:19
|
作者
CAMPBELL, JC
TSANG, WT
QUA, GJ
机构
关键词
D O I
10.1109/EDL.1987.26591
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:171 / 173
页数:3
相关论文
共 50 条
  • [21] Carbon-doped InP/In0.53Ga0.47As single and double heterojunction bipolar transistors grown by solid-source molecular-beam epitaxy
    Zhang, R
    Yoon, SF
    Tan, KH
    Lew, KL
    Sun, ZZ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (05): : 2499 - 2503
  • [22] Heavily carbon-doped In0.53Ga0.47As on InP (001) substrate grown by solid source molecular beam epitaxy
    Cai, WZ
    Lubyshev, DI
    Miller, DL
    Streater, RW
    SpringThorpe, AJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (03): : 1190 - 1194
  • [23] DIFFUSION OF CD IN INP AND IN0.53GA0.47AS
    AYTAC, S
    SCHLACHETZKI, A
    JOURNAL OF CRYSTAL GROWTH, 1983, 64 (01) : 169 - 173
  • [24] INVESTIGATION OF MOLECULAR-BEAM EPITAXIAL IN0.53GA0.47AS REGROWN ON LIQUID-PHASE EPITAXIAL IN0.53GA0.47AS/INP
    NASHIMOTO, Y
    DHAR, S
    HONG, WP
    CHIN, A
    BERGER, P
    BHATTACHARYA, PK
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (02): : 540 - 542
  • [25] Ordering of In and Ga in epitaxially grown In0.53Ga0.47As films on (001)InP substrates
    Shin, Keesam
    Yoo, Junghoon
    Joo, Sungwook
    Mori, Takahiro
    Shindo, Daisuke
    Hanada, Takashi
    Makino, Hisao
    Cho, Meoungwhan
    Yao, Takafumi
    Park, Young-Gil
    MATERIALS TRANSACTIONS, 2006, 47 (04) : 1115 - 1120
  • [26] GA0.47IN0.53AS/INP SUPERLATTICES GROWN BY CHEMICAL BEAM EPITAXY - ABSORPTION, PHOTOLUMINESCENCE EXCITATION, AND PHOTOCURRENT SPECTROSCOPIES
    TSANG, WT
    SCHUBERT, EF
    CHU, SNG
    TAI, K
    SAUER, R
    APPLIED PHYSICS LETTERS, 1987, 50 (09) : 540 - 542
  • [28] VERY HIGH-QUALITY IN(0.53)GA(0.47)AS GROWN BY CHEMICAL BEAM EPITAXY
    TSANG, WT
    SCHUBERT, EF
    DAYEM, AH
    CUNNINGHAM, E
    CHIU, TH
    DITZENBERGER, JA
    SHAH, J
    ZYSKIND, JL
    TABATABAIE, N
    JOURNAL OF ELECTRONIC MATERIALS, 1986, 15 (05) : 307 - 307
  • [29] OPTICALLY PUMPED IN0.53GA0.47AS/INP MQW LASERS GROWN BY CHLORIDE VAPOR-PHASE EPITAXY
    KODAMA, K
    OZEKI, M
    KOMENO, J
    ELECTRONICS LETTERS, 1984, 20 (01) : 48 - 50
  • [30] PHOTO-LUMINESCENCE OF UNDOPED IN0.53GA0.47AS INP GROWN BY THE VAPOR-PHASE EPITAXY TECHNIQUE
    TOWE, E
    JOURNAL OF APPLIED PHYSICS, 1982, 53 (07) : 5136 - 5139