CONTACT-ETCHING OF SEMICONDUCTORS

被引:2
|
作者
RINDNER, W
LAVINE, JM
机构
关键词
D O I
10.1016/0038-1101(61)90035-1
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:190 / &
相关论文
共 50 条
  • [31] PHOTOELECTROCHEMICAL ETCHING OF COMPOUND SEMICONDUCTORS - WAVELENGTH DEPENDENCE
    TENNE, R
    MARCU, V
    PRIOR, Y
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 37 (04): : 205 - 209
  • [32] A THEORY OF CONTACT NOISE IN SEMICONDUCTORS
    MACFARLANE, GG
    PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1950, 63 (370): : 807 - 814
  • [33] ENHANCED ETCHING OF GROUP-III-V SEMICONDUCTORS BY OSCILLATING WITH SPUTTER ETCHING AND REACTIVE ION ETCHING
    DEMOS, AT
    FOGLER, HS
    ETEMADMOGHADAM, H
    ELTA, ME
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (04) : 1143 - 1146
  • [34] ORGANIC SEMICONDUCTORS Healing contact
    Risko, Chad
    Bredas, Jean-Luc
    NATURE MATERIALS, 2013, 12 (12) : 1084 - 1085
  • [35] Effect of fluorocarbon polymer buildup on etching atmosphere and contact etching
    Lee, DD
    Lee, HS
    Kim, SW
    Baik, KH
    PROCEEDINGS OF THE ELEVENTH INTERNATIONAL SYMPOSIUM ON PLASMA PROCESSING, 1996, 96 (12): : 492 - 498
  • [36] Photoinduced etching of thin films of chalcogenide glassy semiconductors
    Dan'ko, V. A.
    Indutnyi, I. Z.
    Min'ko, V. I.
    Shepelyavyi, P. E.
    Bereznyova, O. V.
    Lytvyn, O. S.
    SEMICONDUCTORS, 2012, 46 (04) : 504 - 508
  • [37] REACTIVE ION ETCHING OF III-V SEMICONDUCTORS
    PEARTON, SJ
    INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 1994, 8 (14): : 1781 - 1786
  • [38] Issues of contact etching and pre-treatment in Schottky contact
    Lee, Haksun
    Shin, Kyoungsub
    Cho, Nammyun
    Min, Gyungjin
    Kang, Changjin
    Han, Woosung
    Moon, Jootae
    THIN SOLID FILMS, 2009, 517 (14) : 3844 - 3846
  • [39] Plasma etching of wide bandgap and ultrawide bandgap semiconductors
    Pearton, Stephen J.
    Douglas, Erica A.
    Shul, Randy J.
    Ren, Fan
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2020, 38 (02):
  • [40] Excimer laser-induced etching of semiconductors and metals
    Peyre, J.-L.
    Riviere, D.
    Vannier, C.
    Villela, G.
    Electrical communication, 1988, 62 (3-4): : 222 - 228