THE INFLUENCES OF IMPLANTATION IMPURITIES ON THE FORMATION OF NICKEL SILICIDES ON SILICON AT LOW-TEMPERATURES

被引：0

作者：

CHEN, LJ

WU, IW

LU, SW

机构：

[1] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

[2] NATL TSING HUA UNIV,DEPT MAT SCI & ENGN,HSINCHU 300,TAIWAN

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1987年 / 16卷 / 04期

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：A12 / A12

页数：1

共 50 条

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