THE INFLUENCES OF IMPLANTATION IMPURITIES ON THE FORMATION OF NICKEL SILICIDES ON SILICON AT LOW-TEMPERATURES

被引：0
|
作者：
CHEN, LJ
WU, IW
LU, SW
机构：
[1] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
[2] NATL TSING HUA UNIV,DEPT MAT SCI & ENGN,HSINCHU 300,TAIWAN
来源：
JOURNAL OF ELECTRONIC MATERIALS | 1987年 / 16卷 / 04期
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：A12 / A12
页数：1
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