HETEROGENEOUS SILICON CRYSTAL-GROWTH ON A SINGLE-CRYSTAL SILICON-WAFER

被引：0

作者：

HIDE, I ^{[1
]}

FUJIYA, E ^{[1
]}

MAEDA, Y ^{[1
]}

ITOH, S ^{[1
]}

TANABE, S ^{[1
]}

USUI, T ^{[1
]}

AKAHANE, K ^{[1
]}

机构：

[1] OKI ELECT IND CO LTD,ELECTR DEVICES GRP,HACHIOJI,TOKYO 193,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 12期

关键词：

D O I：

10.1063/1.343606

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5851 / 5853

页数：3

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