FABRICATION AND CHARACTERIZATION OF MULTILEVEL LATERAL NANO-DEVICES

被引:4
|
作者
TAYLOR, RP [1 ]
FENG, Y [1 ]
SACHRAJDA, AS [1 ]
ADAMS, JA [1 ]
DAVIES, M [1 ]
COLERIDGE, PT [1 ]
ZAWADSKI, P [1 ]
机构
[1] NATL RES COUNCIL CANADA,IMS,OTTAWA K1A 0R6,ONTARIO,CANADA
关键词
D O I
10.1016/0039-6028(94)90971-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The design of surface gate patterns, used to define nanostructures in AlGaAs/GaAs heterostructures, is greatly enhanced by the possibility of establishing electrical contact to, and independently biasing, a 100 nm wide isolated gate. We describe the fabrication of a multi-level metallisation architecture which can be used to contact a nanoscale central gate and monitor the transition from a quantum dot to ring geometry. We employ geometry induced quantum interference effects as a novel low temperature characterisation tool and report experiments in which the central electrode acts as an artificial impurity.
引用
收藏
页码:648 / 653
页数:6
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