共 50 条
- [1] PHOTOMETRIC MONITORING OF THE OPTICAL-THICKNESS OF THE LAYERS OF WIDEBAND ANTIREFLECTION COATINGS SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1981, 48 (01): : 45 - 48
- [3] Analysis of errors in the photometric monitoring of layer thickness Journal of Optical Technology (A Translation of Opticheskii Zhurnal), 2001, 68 (03): : 225 - 226
- [4] Photometric monitoring of the thickness of layers with a variable profile Journal of Optical Technology (A Translation of Opticheskii Zhurnal), 1998, 65 (10): : 847 - 850
- [7] AUTOMATION OF THE PHOTOMETRIC MONITORING OF THE THICKNESS OF THIN-FILMS SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1989, 56 (11): : 707 - 709
- [8] THICKNESS MONITORING DURING DEPOSITION OF ANTIREFLECTION COATINGS SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1979, 46 (01): : 48 - 49
- [9] INSTRUMENT FOR TESTING THICKNESS OF COATINGS ON SMALL PARTS METALL, 1978, 32 (10): : 1015 - 1016
- [10] CONTROL-WAVELENGTH DETERMINATION FOR THE APPLICATION OF INTERFERENCE COATINGS IN THE PHOTOMETRIC CONTROL METHOD OPTIKA I SPEKTROSKOPIYA, 1989, 66 (04): : 863 - 867