Analysis of errors in the photometric monitoring of layer thickness

被引：0
|
作者：
Vol'pyan, OD [1 ]
Yakovlev, PP
Meshkov, BB
机构：
[1] OOO Fotron Avto, Moscow, Russia
[2] OAO Sci Res Inst Tech Glass, Moscow, Russia
来源：
JOURNAL OF OPTICAL TECHNOLOGY | 2001年 / 68卷 / 03期
关键词：
D O I：
10.1364/JOT.68.000225
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
This paper uses the method of reverse synthesis to analyze the error distribution in the layer thickness of quarter-wave coatings obtained using photometric monitoring. Results of the modelling of the operation of photometric monitoring are presented. (C) 2001 The Optical Society of America.
引用
收藏
页码：225 / 226
页数：2
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