SMALL PHOTOMETRIC AMPLIFIER FOR MONITORING THICKNESS OF INTERFERENCE COATINGS

被引:0
|
作者
KASIMOV, RI
SUKHANOV, AY
FAZYLZYANOV, RK
机构
来源
SOVIET JOURNAL OF OPTICAL TECHNOLOGY | 1991年 / 58卷 / 08期
关键词
D O I
暂无
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A small photometric amplifier is described for monitoring the thickness of interference coatings. With small dimensions (case diameter of 70 mm and height of 70 mm) the amplifier provides a gain coefficient up to 5000, a d-c output signal up to 10 V, and an a-c output signal up to 7 V. The error in recording transmission extremums amounts to 0.04%. The circuits of the amplifier are given together with calculation formulas and data on the errors in thickness monitoring.
引用
收藏
页码:507 / 508
页数:2
相关论文
共 50 条
  • [21] Influence of fitting algorithms on thickness determination during monitoring of optical coatings
    Melzig, Thomas
    Amochkina, Tatiana
    Bruns, Stefan
    Farr, Philipp
    Terhuerne, Joerg
    Trubetskov, Michael
    Vergoehl, Michael
    SURFACE & COATINGS TECHNOLOGY, 2024, 476
  • [22] Aspects of monitoring the thickness of multicomponent coatings by x-ray methods
    Parnasov, VS
    MEASUREMENT TECHNIQUES, 1996, 39 (05) : 491 - 496
  • [23] Aspects of Monitoring the Thickness of Multicomponent Coatings by X-Ray Methods
    Parnasov, V. S.
    Measurement Techniques (English translation of Izmeritel'naya Tekhnika), 39 (05):
  • [24] BALANCED 2-WAVE METHOD OF MONITORING THE THICKNESS OF OPTICAL COATINGS
    PUTILIN, ES
    ELGART, ZE
    SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1990, 57 (10): : 629 - 631
  • [25] SYNTHESIS OF INTERFERENCE COATINGS BY THE VARIATION OF OPTICAL-THICKNESS OF LAYERS - SOLUTION OF SPECIAL PROBLEMS
    FURMAN, SA
    OPTIKA I SPEKTROSKOPIYA, 1981, 50 (01): : 101 - 110
  • [26] The Coupled Wave Thickness Method as a Universal Method for Synthesizing Interference Antireflection Coatings (π-Structures)
    Kozar, A. V.
    MOSCOW UNIVERSITY PHYSICS BULLETIN, 2020, 75 (06) : 623 - 630
  • [27] LARGE AREA COATINGS WITH UNIFORM THICKNESS FABRICATED IN A SMALL VACUUM CHAMBER
    HAYDEN, CJ
    SPILLER, E
    APPLIED OPTICS, 1989, 28 (14): : 2694 - 2696
  • [28] Photometric calibration of an in situ broadband optical thickness monitoring of thin films in a large vacuum chamber
    Hofman, David
    Sassolas, Benoit
    Michel, Christophe
    Balzarini, Laurent
    Pinard, Laurent
    Teillon, Julien
    David, Bertrand
    Lagrange, Bernard
    Barthelemy-Mazot, Eleonore
    Cagnoli, Gianpietro
    APPLIED OPTICS, 2017, 56 (03) : 409 - 416
  • [29] ELECTRICAL INTERFERENCE INVASION OF PHOTOMETRIC SYSTEMS
    DOWD, GF
    MONKMAN, JL
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1973, (AUG26): : 20 - 20